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| Tipo de formación: | Conformado en frío. | Aplicaciones: | Horno de crecimiento de silicio, horno de crecimiento de semiconductores, otros hornos de calentamie |
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| Tratamiento superficial: | Decapado, acabado laminado, pulido, pulido espejo. a su solicitud. | Código de fabricación: | ASME, PED/UE, DIN 28011, DIN280913, GB/T. |
| Orden personalizada: | Aceptado. | ||
| Resaltar: | ASME stainless steel vacuum chamber,Dished heads for semiconductor furnace,Elliptical head silicon furnace |
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ASME Stainless Steel Vacuum Chamber Dished Heads for Silicon Semiconductor Furnace 1.Specification of ASME Vacuum Chamber Dished Heads: Specifications of ASME Stainless Steel Vacuum Chamber Dished Heads Inner Diameter 1600mm (Seamless, Weldfree), other diameters are available upon your request. Nominal Thickness 10mm, other thickness are available as your request. Minimum Thickness 8.5mm Shapes Elliptical/Ellipsoidal. Other Shapes are available as your request. Available
Persona de Contacto: Lynn Chen
Teléfono: +86 15037307289