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Détails sur le produit:
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| Type de formage: | Formage à froid. | Applications: | Four de croissance de silicium, four de croissance de semi-conducteurs, autres fours de chauffage, e |
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| Traitement de surface: | Décapage, finition de moulin, polissage, polissage miroir. sur votre demande. | Code de fabrication: | ASME, PED/UE, DIN 28011, DIN280913, GB/T. |
| Commande personnalisée: | Admis. | ||
| Mettre en évidence: | ASME stainless steel vacuum chamber,Dished heads for semiconductor furnace,Elliptical head silicon furnace |
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ASME Stainless Steel Vacuum Chamber Dished Heads for Silicon Semiconductor Furnace 1.Specification of ASME Vacuum Chamber Dished Heads: Specifications of ASME Stainless Steel Vacuum Chamber Dished Heads Inner Diameter 1600mm (Seamless, Weldfree), other diameters are available upon your request. Nominal Thickness 10mm, other thickness are available as your request. Minimum Thickness 8.5mm Shapes Elliptical/Ellipsoidal. Other Shapes are available as your request. Available
Personne à contacter: Lynn Chen
Téléphone: +86 15037307289