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商品の詳細:
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| フォーミングタイプ: | 冷間成形。 | アプリケーション: | シリコン成長炉、半導体成長炉、その他加熱炉など |
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| 表面処理: | 酸洗、ミル仕上げ、研磨、鏡面研磨。ご要望に応じて。 | 製造コード: | ASME、PED/EU、DIN 28011、DIN280913、GB/T。 |
| カスタムオーダー: | 受け入れられる。 | ||
| ハイライト: | ASME stainless steel vacuum chamber,Dished heads for semiconductor furnace,Elliptical head silicon furnace |
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ASME Stainless Steel Vacuum Chamber Dished Heads for Silicon Semiconductor Furnace 1.Specification of ASME Vacuum Chamber Dished Heads: Specifications of ASME Stainless Steel Vacuum Chamber Dished Heads Inner Diameter 1600mm (Seamless, Weldfree), other diameters are available upon your request. Nominal Thickness 10mm, other thickness are available as your request. Minimum Thickness 8.5mm Shapes Elliptical/Ellipsoidal. Other Shapes are available as your request. Available
コンタクトパーソン: Lynn Chen
電話番号: +86 15037307289
